Microwaves produce higher density plasma (ions/radicals) and lower substrate-induced bias compared to RF plasma. Due to this fact, higher ashing rates and lower plasma damage of photoresist in microwave plasma are expected. The IoN Wave 10 plasma system is designed for R&D and small-scale production applications. PVA TePla is a proven and trusted global source for high quality, reliable, cost-effective and easy-to-operate gas plasma systems. It offers some of the most advanced and innovative solutions for various applications.