The IoN Tumbler plasma system is one of our latest advancements in vacuum plasma technology.
Due to its versatility and low environmental impact, gas plasma is rapidly becoming the technique of choice for surface modification of materials in life sciences, electronics, and industry.
For example, the trend toward miniaturization in medical diagnostics requires precise cleaning and selective chemical functionalization.
Plasma removes organic pollutants orders of magnitude more efficiently than wet chemical treatments and can chemically functionalize surfaces at the nanoscale.
As a result, plasma is replacing older types of treatments that are no longer practical or economical.
The IoN Tumbler is designed to meet the changing needs of customers, emphasizing versatility and control over finishing needs.
Its advanced features provide state-of-the-art process control, fail-safe system alarms and data capture software.
This enables the system to meet the stringent quality control procedures found in the life sciences industry.
The IoN Tumbler uses radio frequency (RF) generated plasma in a compact, fully integrated package.
Another design feature of the new IoN Tumbler is the ability to quickly and easily switch between different chamber sizes and parts basket configurations.