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IoN 100 Plasma System
Introduction

The IoN 100 is a cartridge plasma reactor designed for R&D and production applications. The technology is based on a proven reactor design developed over 50 years by International Plasma Corporation, Branson ICP, Dionex, Gasonics, Metroline, TePla and PVA TePla. The IoN 100 uses a larger enclosure that provides all gas and power connections.

Features include:

  • Plug and play self-installation
  • flexible electrode
  • Industrial computer with LCD touch screen and keyboard.
  • Windows-based operating system.
  • Graphical User Interface (GUI) software compliant with
  • CFR Title 21 Part 11 and Semi E95-1101
  • multi-level user access
  • software
    • Recipe editor for fast and versatile step control
    • Onboard diagnostics and alarm logging
    • Remote process monitoring via Ethernet
    • Web-based online simulations/training/support
  • Pump Power Receptacle on Enclosure
  • Energy saving function - pump control

typical application:

  • surface cleaning
  • surface activation
  • Surface functionalization
  • Deposition of siloxane and organic thin films
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In order to pursue the excellent quality of our products, we continually develop manufacturing technology. A superior testing environment was created to guarantee high accuracy and quality of each our provided equipment. Besides, we constantly focus on improving the manufacturing process to increase efficiency and productivity, and to reduce production cost. We, therefore, are able to immeditately respond to customers’ needs with highly competitive products.

CONTACT

M&R Nano Technology Co., LTD. : No. 10, Lane 863, Gaoshi Road, Yangmei District, Taoyuan City
M&R Nano Technology (Dongguan) Co., LTD. : No. 239-7, Middle Dezheng Road, Xianxi Community, Chang 'an Town, Dongguan City

400-699-2885

sam@mrnanotec.com

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