SITE MAP|LANGUAGE
Current LocationHome -> Product -> Transistor equipment
Wafer cleaning etcher
Introduction

project

parameter

Wafer size

6”-12”

Etching material

Si, SiC, GaAs, GaN4, etc. can be customized

production capacity

38PCS (180s per run)

 

Process index

UPTIME>95%, MTTR< 4H ,

Particle added value  <20ea@0.2um 8” Bare


HOTLINE:400-600-8500

If there is any need for our service, please contact us, we will have someone to contact you, thank you!CONTACT

In order to pursue the excellent quality of our products, we continually develop manufacturing technology. A superior testing environment was created to guarantee high accuracy and quality of each our provided equipment. Besides, we constantly focus on improving the manufacturing process to increase efficiency and productivity, and to reduce production cost. We, therefore, are able to immeditately respond to customers’ needs with highly competitive products.

CONTACT

M&R Nano Technology Co., LTD. : No. 10, Lane 863, Gaoshi Road, Yangmei District, Taoyuan City
M&R Nano Technology (Dongguan) Co., LTD. : No. 239-7, Middle Dezheng Road, Xianxi Community, Chang 'an Town, Dongguan City

400-699-2885

sam@mrnanotec.com

CopyRight ©2023 M&R Nano Technology Co., Ltd. All Rights Reserved 粤ICP备20001311号